Subject: LABORATORY OF NANOFABRICATION (A.A. 2020/2021)
Unit Laboratory of Nanofabrication
Experimental and Applied Studies (lesson)
This laboratory course prepares students to the use of top-down lithographic techniques and bottom-up
techniques for the fabrication of micro/nanostructured samples to be studied experimentally. Teaching
aims of the course are:
- Knowledge of the basic working principles of the main micro and nanofabrication top-down
lithographic techniques, employed in research as well as in industry. Knowledge of the basic principles
for bottom-up fabrication of nanostructures and nanoparticles from gas aggregation techniques.
- Develop the technical skills to use the in-house nanofabrication facilities (Photolithography (PL),
Electron Beam Lithography (EBL), Focused Ion Beam (FIB), nanocluster source) through intensive
- Ability to produce micro/nanostructured samples from design to realization, applying the different topdown and bottom-up approaches available
None required. A good knowledge of structure of matter and condensed matter physics is strongly advised.
Basic principles of the selected micro and nanofabrication techniques based on top-down and bottom- up approaches:
Photolithography (PL), Electron Beam Lithography (EBL), Focused Ion Beam (FIB), growth of nanoparticles with gas aggregation sources.
Hands-on activity in the nanofabrication laboratories of the Department (PL and EBL Laboratory, FIB Laboratory, nanocluster source) to develop autonomous operation of the different techniques and eventually to realize an own project.
- Lectures presenting the main micro and nanofabrication techniques based on the top-down approach. - Under supervision, the students will be trained on the nanofabrication facilities available in the department (PL and EBL Laboratory, FIB Laboratory, nanoclusters source). - Students in small groups will be assigned a project: the design and realization of a micro/nanostructured sample (e.g. amplitude and phase gratings, double slit for electrons, nanocluster deposition) that will be characterized experimentally.
Each group should produce a written report describing their project, which will be also discussed in an oral presentation. The knowledge of the topics covered by lectures will be also subject to oral examination.
Knowledge and understanding
At the end of the course the student would know the basic working principle of selected micro and nanofabrication techniques based on top-down and bottom-up approaches (Photolithography (PL), Electron Beam Lithography (EBL), Focused Ion Beam (FIB), Nanocluster Deposition).
Applying knowledge and understanding:
At the end of the course the student would be able to design and realize micro/nanostructured samples through the above mentioned techniques.
At the end of the course students would be able to manage the different steps of resist-based lithographies and to use focused ion and electron beam for nanofabrication as well as analysis of the produced devices.
At the end of the course students would be able to approach the realization of a nanostructured sample using the most suitable nanofabrication approach.